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Experimental and modelling investigation of the influence of noise transit time and self-heating on microwave noise of Si/SiGe:C and InP/InGaAs HBTs

机译:噪声传播时间和自热对Si / SiGe:C和InP / InGaAs HBT微波噪声影响的实验和模型研究

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摘要

The results of a comprehensive experimental and modelling investigation of high-frequency noise (HFN) of Si/SiGe:C and InP/InGaAs heterojunction bipolar transistors (HBTs) demonstrate that the key parameters to correctly model HFN for both HBTs are the self-heating (SH) effect at high collector injection levels, I.e. J_C > 2-3 mA μm~(-2), and the noise transport time (t) which must be included at all bias levels. In contrast, thermal noise contribution of the base-emitter junction of the Si/SiGe:C HBT, associated with the diffusive nature of electron transport at this junction because of the lack of conduction band discontinuity, is only important at operation frequencies lying in the frequency range f > f_T/2. The noise analysis indicates that in order to correctly model HFN performances at any injection level and operation frequency, τ must be constant with bias and equal to the addition of base and collector transit times (τ_b + τ_C). On the other hand, at high J_C levels if SH is neglected, then the amplitude of the equivalent noise resistance (R_n) will be the most impacted noise parameter for both HBTs. Concerning the InP/InGaAs HBT, if SH is off at J_C = 5.5 mA μtm~(-2), the minimum noise figure (NF_( min)) of the InP HBT will be underestimated by 10%.
机译:对Si / SiGe:C和InP / InGaAs异质结双极晶体管(HBT)的高频噪声(HFN)进行全面实验和建模研究的结果表明,为这两种HBT正确建模HFN的关键参数是自热(SH)在高捕集剂注入水平下的效应,即J_C> 2-3 mAμm〜(-2),并且必须在所有偏置电平下包括噪声传输时间(t)。相比之下,由于缺乏导带不连续性,Si / SiGe:C HBT基极-发射极结的热噪声贡献与该结处电子传输的扩散特性有关,仅在工作频率位于频率范围f> f_T / 2。噪声分析表明,为了在任何注入水平和工作频率下正确建模HFN性能,τ必须在偏置下保持恒定,并且等于基极和集电极渡越时间(τ_b+τ_C)的和。另一方面,在高J_C级别上,如果忽略SH,则等效噪声电阻(R_n)的幅度将是两个HBT受影响最大的噪声参数。关于InP / InGaAs HBT,如果SH在J_C = 5.5 mAμtm〜(-2)处关闭,则InP HBT的最小噪声系数(NF_(min))将低估10%。

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  • 来源
    《Semiconductor science and technology》 |2012年第6期|p.19.1-19.9|共9页
  • 作者单位

    Instituto Politecnico Nacional, UPALM, Edif Z-4 3er Piso, CP 07738, Mexico DF, Mexico,Institut d'Electronique Fondamentale, Univ Paris-Sud, CNRS UMR 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Univ Paris-Sud, CNRS UMR 8622, 91405 Orsay, France;

    Instituto Politecnico Nacional, UPALM, Edif Z-4 3er Piso, CP 07738, Mexico DF, Mexico;

    Alcatel-Thales III-V Lab, Route de Nozay, Marcoussis F-91460, France;

    Institut d'Electronique Fondamentale, Univ Paris-Sud, CNRS UMR 8622, 91405 Orsay, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 01:31:04

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