机译:垂直沟道双栅极nMOSFET中的总电离剂量和单事件效应
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China;
机译:新型垂直沟道双栅极nMOSFET的总电离剂量效应
机译:总电离剂量辐照对商业增强型AlGaN / GaN高电子迁移率晶体管单事件烧毁的影响
机译:总电离剂量对130nm PD SOI SRAM单事件翻转灵敏度的影响
机译:0.18 UM窄通道I / O nMOSFETS的总电离剂量响应
机译:功率垂直双扩散金属氧化物半导体场效应晶体管中的总电离剂量效应。
机译:通过离子辐射对脂膜中多烯抗生素两性霉素B和制霉菌素形成的离子通道进行辐射灭活:剂量率的反比行为。
机译:在130nm T型栅极PDSOI I / O NMOSFET中的总电离剂量诱导的身体屏蔽效果