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Physics of dynamic threshold voltage and steep subthreshold swing in Al2O3-InAlN-GaN MOSHEMTs

机译:Al2O3-InAlN-GaN MOSHEMT中的动态阈值电压和陡峭的亚阈值摆幅的物理学

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摘要

The impact of Al2O3-InAlN interface traps on the switching characteristics of Al2O3-InAlN-GaN MOSHEMTs was examined using temperature-dependent current-voltage characterization. A steep subthreshold swing (SS) as low as 37 mV/dec at 25 degrees C is obtained, and shows negative temperature dependence up to 180 degrees C. We attribute this behavior to the dynamic threshold voltage (V-th) induced by the de-trapping of the acceptor-like interface traps near the InAlN conduction-band edge, which acts as a positive feedback in increasing the drain current during the switch-on process. At elevated temperature, the thermally activated de-trapping of the deeper traps results in a more sufficient dynamic shift in V-th and then leads to a steeper SS. The traps contributing to the steep SS were found within the energy levels ranging from E-C - 0.55 to E-C - 0.833 eV for the measured temperature range (25-180 degrees C). On the other hand, the interface traps near the midgap or at deeper energy levels act as quasi-fixed charges, which feature negligible impact on the switching behavior of the device.
机译:使用随温度变化的电流-电压特性,研究了Al2O3-InAlN界面陷阱对Al2O3-InAlN-GaN MOSHEMT开关特性的影响。在25°C时可获得低至37 mV / dec的陡峭亚阈值摆幅(SS),并且显示出高达180°C的负温度依赖性。我们将此行为归因于由de引起的动态阈值电压(Vth)。 InAlN导带边缘附近的类受体界面陷阱的俘获,在接通过程中作为增加漏极电流的正反馈。在升高的温度下,较深陷阱的热激活去陷阱会导致V-th的动态位移更加充分,然后导致SS陡峭。在测得的温度范围(25-180摄氏度)下,发现在陡峭的SS处形成的陷阱的能级范围为E-C-0.55至E-C-0.833 eV。另一方面,接近中间能隙或处于较高能级的界面陷阱起准固定电荷的作用,其对器件开关性能的影响可忽略不计。

著录项

  • 来源
    《Semiconductor science and technology》 |2016年第3期|035005.1-035005.7|共7页
  • 作者单位

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China|Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab ASIC, Shijiazhuang 050051, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InAlN-GaN MOSHEMT; dynamic threshold voltage; interface traps; steep subthreshold swing; high temperature;

    机译:InAlN-GaN MOSHEMT;动态阈值电压;界面陷阱;陡峭的亚阈值摆幅;高温;
  • 入库时间 2022-08-18 01:29:54

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