首页> 外文期刊>Semiconductor science and technology >Optical characteristics of GaAsSb alloy after rapid thermal annealing
【24h】

Optical characteristics of GaAsSb alloy after rapid thermal annealing

机译:快速热退火后GaAsSb合金的光学特性

获取原文
获取原文并翻译 | 示例
       

摘要

GaAsSb ternary alloy is a promising material for application in infrared optoelectronic devices. In this letter, the investigation of carrier recombination in the as-grown and rapid thermal annealing (RTA) treated GaAsSb samples has been carried out. It was found that after thermal treatment the emission of the GaAsSb material was enhanced and could be maintained up to room temperature. These phenomena can be ascribed to the decrease of non-radiative combination defects in the GaAsSb sample, which implies an improved crystal quality. Moreover, the localized exciton-longitudinal optical phonon interaction is slightly increased after RTA treatment. It is suggested that the interaction depends strongly on the localized states, and the photoluminescence emission intensity can be significantly increased after suitable RTA treatment. Promoting better optical emission in GaAsSb is very useful for its practical application.
机译:GaAsSb三元合金是用于红外光电器件的有前途的材料。在这封信中,已经对生长中的快速热退火(RTA)处理的GaAsSb样品中的载流子复合进行了研究。发现在热处理之后,GaAsSb材料的发射得到增强并且可以保持到室温。这些现象可归因于GaAsSb样品中非辐射结合缺陷的减少,这意味着晶体质量的提高。此外,RTA处理后局部激子-纵向光学声子相互作用略有增加。建议相互作用强烈地依赖于局部状态,并且在适当的RTA处理之后可以显着增加光致发光发射强度。在GaAsSb中促进更好的光发射对于其实际应用非常有用。

著录项

  • 来源
    《Semiconductor science and technology》 |2017年第11期|114007.1-114007.7|共7页
  • 作者单位

    South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen 518055, Guangdong, Peoples R China|Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen 518055, Guangdong, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, 7089 Wei Xing Rd, Changchun 130022, Jilin, Peoples R China;

    South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen 518055, Guangdong, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    photoluminescence; localized state; exciton; exciton-phonon interaction; rapid thermal annealing;

    机译:光致发光;局域态;激子;激子-声子相互作用;快速热退火;
  • 入库时间 2022-08-18 01:29:46

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号