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Indium incorporation and optical properties of polar, semipolar and nonpolar InAlN

机译:极性,半极性和非极性InAlN的铟掺入及其光学性质

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Indium incorporation and the optical properties of InxAl1-xN layers (0 <= x <= 0.45) grown by metalorganic vapour phase epitaxy have been investigated simultaneously on polar (0001), untwinned semipolar (10 (1) over bar3) and nonpolar (10 (1) over bar0) AlN templates, which were prepared on planar sapphire substrates. The InN mole fraction (x(InN)) of the layers was tuned by changing growth temperature from 660 degrees C to 860 degrees C. x(InN) determined by x-ray diffraction was found to be comparable for the polar, semipolar and nonpolar surface orientations. This is consistent with comparable effective bandgap energy of the layers obtained from optical transmission measurements at room temperature. The bandgap bowing parameter was found to be strongly composition-dependent. Room-temperature photoluminescence measurements showed impurity transitions for the layers with x(InN) <= 0.2, while InAlN near-band-edge luminescence was observed for the layers with higher x(InN).
机译:同时研究了极性(0001),未缠绕的半极性(bar3上的10(1))和非极性(10)上通过金属有机气相外延生长的铟掺入和InxAl1-xN层(0 <= x <= 0.45)的光学性质(1)在bar0)AlN模板上,这些模板是在平面蓝宝石衬底上制备的。通过将生长温度从660摄氏度更改为860摄氏度来调整层的InN摩尔分数(x(InN))。发现通过X射线衍射测定的x(InN)与极性,半极性和非极性相当表面取向。这与从室温下的光透射测量获得的层的相当的有效带隙能量一致。发现带隙弯曲参数强烈依赖于组成。室温光致发光测量表明,x(InN)<= 0.2的层存在杂质跃迁,而x(InN)较高的层则观察到InAlN近带边缘发光。

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