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Effect of high energy (15MeV) proton irradiation on vertical power 4H-SiC MOSFETs

机译:高能(15MeV)质子辐照对垂直功率4H-SiC MOSFET的影响

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摘要

The effect of irradiation with 15 MeV protons on the electrical properties of high-power vertical 4H-SiC MOSFETs of 1.2 kV class has been studied experimentally with doses in the range 0 = Phi = 10(14) cm(-2). Dose Phi(cr), signifying the complete degradation of the device, corresponds to the condition Phi cr approximate to n0/eta e (eta e is the electron removal rate and n o is the electron concentration in the unirradiated drift layer). In the devices under study, Phi cr is 10(14) cm(-2). The effect of irradiation on the leakage current, gate-drain capacitance, transconductance, and field mobility was examined.
机译:实验研究了15 MeV质子辐照对1.2 kV级大功率垂直4H-SiC MOSFET的电性能的影响,剂量范围为0 <= Phi <= 10(14)cm(-2)。表示器件完全降解的剂量Phi(cr)对应于条件Phi cr近似于n0 / eta e(eta e是电子去除率,n o是未辐照漂移层中的电子浓度)。在所研究的设备中,Phi cr为10(14)cm(-2)。检查了辐射对漏电流,栅漏电容,跨导和场迁移率的影响。

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  • 来源
    《Semiconductor science and technology》 |2019年第4期|045004.1-045004.5|共5页
  • 作者单位

    Ioffe Inst, Polytekhnicheskaya 26, St Petersburg 194021, Russia;

    St Petersburg State Polytech Univ, Dept Expt Phys, Polytekhnicheskaya 29, St Petersburg 195251, Russia;

    Ioffe Inst, Polytekhnicheskaya 26, St Petersburg 194021, Russia;

    Ioffe Inst, Polytekhnicheskaya 26, St Petersburg 194021, Russia;

    Ioffe Inst, Polytekhnicheskaya 26, St Petersburg 194021, Russia;

    Natl Res Univ Informat Technol Mech & Opt, St Petersburg 197101, Russia;

    United Silicon Carbide Inc, 7 Deer Pk Dr,Suite E, Monmouth Jct, NJ 08852 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    silicon carbide; power MOSFETs; proton irradiation;

    机译:碳化硅;功率MOSFET;质子辐照;

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