Hydrogen effects on AlGaN/GaN MISFET with LPCVD-SiNx gate dielectric

摘要

In this work, the effects of hydrogen on an AlGaN/GaN metal insulator semiconductor field effect transistor (MISFET) with SiNx gate dielectric were investigated. It is found that after hydrogen exposure, (1) the AlGaN/GaN MISFET exhibits better DC performance with larger maximum transconductance, (2) the gate lag phenomenon is effectively suppressed and (3) the 1/f noise performance is improved with lower noise magnitude. These results are different from previous observations in other III-V semiconductor devices. Based on the theoretical analysis by space charge limited current and low-frequency noise models, we propose that the hydrogen treatment induces hydrogen incorporation into SiNx, which could passivate the defect centers. These findings demonstrate the high hydrogen tolerance of AlGaN/GaN MISFETs.