Application of Advanced Phase-Shift Masks

摘要

Many different PSM options have been developed, widely discussed and evaluated since PSMs were first proposed for lithography. Every time there is concern about the reliability and/or availability of other lithography options, more PSM applications are considered. By the mid-1990s, HTPSMs had gathered widespread production application, since they deliver a significant benefit at a relatively small cost in manufacturing, data handling and usage. The late projected arrival of 157 nm and next-generation (non-optical) lithography has again increased the general interest in PSMs. But this time a whole new set of critical issues has to be dealt with to decide on the most appropriate and economical option. These more aggressive PSM options require more and more effort to thoroughly answer with confidence all the questions necessary for these decisions. In addition, the current surge of fab-less companies and foundries decreases the interaction between designers and process people, thereby decreasing the available choices. Creative software solutions will be necessary to provide the feedback from manufacturing and from data preparation into the design realm to fully utilize the potential of advanced PSMs.