Mist Deposition in Semiconductor Device Manufacturing

摘要

The results discussed in this paper demonstrate the feasibility of mist deposition in the formation of very thin films in advanced nanoelectronic and photonic manufacturing using liquid precursors. In both cases of photoresist and high-k dielectric processing, deposition is well controlled and produces uniform, mechanically coherent films, even in the ultrathin thickness regime. The method is independent of the shape of the substrate, and hence, in the case of photoresist, can be used not only in standard wafer processing, but also in large display as well as large reticle manufacturing. Overall, mist deposition has the potential to supplement spin-on process in those applications in which effectiveness of the latter will be limited. By doing so, mist deposition may extend the use of liquid precursors in high-end IC, as well as LCD, manufacturing by supplementing spin-on processes in selected applications.