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Dip Pen Nanolithography Heats Up

机译:浸笔纳米光刻技术升温

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摘要

As we march along the inexorable path toward nan-otechnology, there is a seemingly endless array of ideas about how to get there. One increasingly popular idea is dip pen nanolithography (DPN), which uses atomic force microscopy (AFM) probes to write nanometer-scale lines directly onto a substrate. Now researchers from the Georgia Institute of Technology (Atlanta) and the Naval Research Laboratory (NRL, Washington) have improved upon the technique, using heat to achieve some important new capabilities. Dubbed thermal dip pen nanolithography (tDPN), the new technique overcomes previous limitations that have been encountered by dozens of research groups.
机译:当我们沿着通往纳米技术的必然之路前进时,关于如何到达纳米技术似乎有无穷无尽的想法。一种越来越流行的想法是浸笔式纳米光刻(DPN),它使用原子力显微镜(AFM)探针将纳米级线直接写到基板上。现在,来自佐治亚理工学院(亚特兰大)和海军研究实验室(华盛顿州NRL)的研究人员已经对该技术进行了改进,利用热量来实现一些重要的新功能。被称为热浸笔纳米光刻(tDPN)的新技术克服了数十个研究小组以前遇到的局限性。

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