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Thermal control of deposition in the dip pen nanolithography
Thermal control of deposition in the dip pen nanolithography
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机译:浸笔纳米光刻中沉积的热控制
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摘要
PROBLEM TO BE SOLVED: To provide a device capable of depositing ink in a vacuum without the risk of contamination using a fine chip, capable of changing a deposition rate without cutting-off the chip with a substrate, further capable of making the deposition of ink on-off, and capable of obtaining high spatial resolution.;SOLUTION: Ink 20 coated on the surface of a chip 10 formed on a cantilever 40 is contacted with a substrate 30. The chip 10 is actually very small to the cantilever 40. Since the chip 10 is heated with a resistivity element 60, a heating element 50 is fitted to the cantilever 40. The deposition of the ink 20 to the substrate 30 is made on-off by increasing the temperature of the tip of the chip 10 to the melting temperature of the ink 20 or higher by heating or stopping the heating and decreasing the temperature to the melting temperature of the ink 20 or lower.;COPYRIGHT: (C)2015,JPO&INPIT
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