Nanopositioning substrate preparation apparatus and preparation method using dip pen nanolithography with a single tip or multiple tips using atomic force microscope (AFM)

摘要

Provided are method and apparatus to nanoposition ink, the apparatus including: a substrate; a pattern index; an atomic force microscope (AMF) tip configured to form a pattern on the pattern index; a first ink reservoir including a first ink; a second ink reservoir including a second ink; a first cleaning portion configured to remove the first ink from the AMF tip; a second washing portion configured to remove the second ink from the AMF tip; a position determining portion configured to interact with the AMF tip; an electrode connection portion configured to apply a voltage to the position determining portion, in order to determine a position of the AMF tip when the AMF tip interacts with the position determining portion. The AMF tip is configured to configured to interact with the position determining portion, prior to forming the pattern using the first and second inks.