NANOPOSITIONING SUBSTRATE PREPARATION APPARATUS AND PREPARATION METHOD USING DIP PEN NANOLITHOGRAPHY WITH SINGLE OR MULTIPLE TIPS USING ATOMIC FORCE MICROSCOPE (AFM)

摘要

The present invention relates to dip pen nanolithography technique which is an imaging method using a atomic force microscope, and more specifically, to a preparation apparatus and a preparation method for a nanopositioning substrate of an ink system using dip pen nanolithography with a single or multiple tips. According to the present invention, with respect to the imaging method using the atomic force microscope, provided is the preparation apparatus and the preparation method for the nanopositioning substrate of the ink system using dip pen nanolithography, with single or multiple tips, comprising: a first ink storage portion and a second ink storage portion for coating a tip with an ink; a first washing portion and a second washing portion for washing the tip coated with an ink; a pattern carving portion for carving a tip on a substrate; an electrode connection portion for applying voltage; and a position checking portion for checking or determining the position of the coated tip on a micrometer-scale area, wherein the position checking portion is formed to check position through the change of a voltage-current, the extent of bending of an AFM tip with respect to voltage and an AFM image; and it is possible to increase the density of a biomaterial on the micrometer-scale area by integrating a large number of the biomaterial on the substrate by using the reproducibility of the atomic force microscope tip position.