No Significant Materials Changes for 65 nm?

摘要

Asked to sum up the technology and business challenges in the transition from 90 to 65 nm, panelists at a DuPont event during SEMICON West came up with some interesting conclusions: 1. High-k gate dielectrics will not be used at the 65 nm node, but will wait until 45 nm. 2. 65 nm technology will be on time. 3. 65 nm appears to be the 300 mm generation, but the jury is still out on 65 nm/200 mm wafers. 4. 90 nm low-k materials (k～2.8) will be used at 65 nm. 5. Fewer new materials will be introduced at 65 nm than originally anticipated. 6. A new business model for new materials creation may be needed to enable ROI and company sus-tainability.