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Chalcogenide Thin Films Prepared using Chemical Bath Deposition Method: Review

机译:化学浴沉积法制备硫属化物薄膜综述

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The aim of this study is to discuss the synthesis of thin films using chemical bath deposition method. In recent years, studies of thin films of different groups have attracted great attention due to their applications are possible in many areas of modern technology. Researchers have deposited binary, ternary and quaternary thin films from aqueous solutions using chemical bath deposition method. Here, the growth of metal sulfide, selenide and telluride thin films has been reported. The influence of deposition parameters on the physical properties of films was investigated. The research findings indicate that an increase in deposition time allows more materials to be deposited onto the substrate. Morphological studies of films show that the films thicknesses were increased as the bath temperature was increased.
机译:这项研究的目的是讨论使用化学浴沉积法合成薄膜的方法。近年来,由于薄膜的应用在现代技术的许多领域中,不同种类的薄膜的研究引起了极大的关注。研究人员已经使用化学浴沉积法从水溶液中沉积了二元,三元和四元薄膜。在此,已经报道了金属硫化物,硒化物和碲化物薄膜的生长。研究了沉积参数对薄膜物理性能的影响。研究发现表明,沉积时间的增加允许更多的材料沉积到基板上。膜的形态学研究表明,随着浴温的升高,膜的厚度也随之增加。

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