Building micro/milli robots with a lithography machine

摘要

Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, advanced lithography technologies are being extensively developed such that next generation lithography tools, e.g., extreme ultra-violet (EUV) lithography systems, are able to provide higher resolution, higher throughput, and more robust performance. The capability of accurately printing complex patterns with nanometre-scale critical dimensions (CDs) onto a semiconductor wafer, e.g., by EUV lithography, has enabled a very broad range of applications and opened up a world of possibilities. One of such possibilities is to make a large quantity of miniature robots with CDs either less than 1 millimeter (mm) in the case of microrobts, or 1 centimeter (mm) in the case of millirobots.