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BEAM SCANNING FOR DOSE UNIFORMITY

机译:光束扫描以实现剂量均匀性

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A low max/min ratio of absorbed dose is a prime objective in any industrial irradiation process. The IMPELA® electron beam irradiator has been further developed to deliver a beam distribution that can be tailored to match the required dose uniformity for specific products and applications. Thus, for the first time, the beam source can be readily adjusted to create an acceptable max/min ratio. Prior knowledge of product geometry and density anisotropy, together with off-line dosimetry measurements, are used to specify the beam distribution necessary to provide a uniform absorbed dose. The characteristics of two scanning methods are examined: deflection of the beam across the product width within each beam pulse, and a slow scan covering the width with many beam pulses. Product-specific distributions are achieved by reducing the duration of individual pulses and tailoring the scan waveform during a slow scan. Examples will be given of irradiations carried out on the 10 MeV, 50 kW accelerator at Chalk River Laboratories.
机译:在任何工业辐照过程中,吸收剂量的最大/最小比率低是主要目标。 IMPELA®电子束辐照器经过进一步开发,可提供可根据特定产品和应用要求的剂量均匀性进行定制的束分布。因此,第一次,可以容易地调节光束源以产生可接受的最大/最小比率。产品几何形状和密度各向异性的先验知识,以及离线剂量测定法,用于指定提供均匀吸收剂量所需的光束分布。检查了两种扫描方法的特性:在每个光束脉冲内光束在整个产品宽度上的偏转,以及覆盖许多光束脉冲宽度的慢速扫描。通过减少单个脉冲的持续时间并在慢速扫描期间调整扫描波形来实现特定产品的分布。在Chalk River实验室,将举例说明在10 MeV,50 kW加速器上进行的辐照。

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