首页>
外国专利>
Apparatus amp; method for ion beam implantation using scanning and spot beams with improved high dose beam quality
Apparatus amp; method for ion beam implantation using scanning and spot beams with improved high dose beam quality
展开▼
机译:使用具有改善的高剂量束质量的扫描束和点束进行离子束注入的设备和方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for forming a converging beam on AMU-non-dispersive plane therefrom. The ion implantation apparatus includes magnetic scanner prior to a magnetic analyzer for scanning the beam on the non-dispersive plane, the magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. A rectangular quadruple magnet is provided to collimate the scanned ion beam and fine corrections of the beam incident angles onto a target. A deceleration or acceleration system incorporating energy filtering is at downstream of the beam collimator. A two-dimensional mechanical scanning system for scanning the target is disclosed, in which a beam diagnostic means is built in.
展开▼