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Growth of semi-insulating GaAs crystals in low temperature gradients by using the vapour pressure controlled czochralski method (VCz)

机译:通过使用蒸气压控制的czochralski方法(VCz)在低温梯度下生长半绝缘GaAs晶体

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Te present paper gives a review on fundamentals, modelling growth, structural and electrical proper- ties of semi-insulating GaAs single crystals, grown in low temperature gradients by the Vapour Pressure Controlled Czochralski Method (VCz), with diameters from 75 up to 150 up to 150 mm. Special attention is drawn to The investigation of the temperature-fields inside the growing crystals (and thus thermoelastic stress). Addi- Tionally, the influence of convective transport of heat within melt and inert gas is investigated by both ex- Periment and modelling. Thermodynamic aspects of arsenic pressure control within the inner VCz chamber As well as the special experimental and technological challenges are discussed.
机译:本文综述了半绝缘GaAs单晶的基本原理,模型生长,结构和电学特性,它们是通过蒸汽压力控制直拉法(VCz)在低温梯度下生长的,直径从75到150微米不等。到150毫米特别注意研究正在生长的晶体内部的温度场(以及热弹性应力)。另外,通过实验和模型研究了热在熔体和惰性气体中的对流传输的影响。讨论了内部VCz腔室内砷压力控制的热力学方面以及特殊的实验和技术挑战。

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