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Manipulation of ellipsoidal nanoparticles considering roughness based on atomic force microscopy

机译:基于原子力显微镜的考虑粗糙度的椭圆形纳米粒子的处理

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The contribution in this paper is to investigate the manipulation of ellipsoidal nanoparticles by atomic force microscopy, taking into consideration of roughness. For the first phase of manipulation, roughness was investigated just for the substrate, but for the second phase, it begins by particle movement substrate and particle roughness is considered. The particle is of gold material; moreover, tip and substrate are made of silicon. Having examined the effective parameters of the contact mechanics, including the indentation depth and contact area for the Hertz, Jamari and Jeng-Wang models, two Jamari and Jeng-Wang contact models were used to consider the particle-probe contact and the particle-substrate contact respectively. By these two models, the first phase of manipulation process is simulated. At the end of this step, the force and the time, by which the particle starts moving, are detected. The next phase of manipulation begins with particle movement initiation and ends when it reaches the target point, which is called the second phase of manipulation. In order to simulate the second phase of manipulation, the Wilson model is used. Also, due to the fact that no surface is completely smooth and it has roughness that affects the amount of friction force and consequently manipulation relations, in order to bring the results closer to reality, in this article the Rumpf and Rabinovich models are used. In the first phase of manipulation for modelling the substrate roughness, Rumpf and Rabinovich models are used. Moreover, Rumpf model is used for modelling the particle and substrate roughness in the second phase of manipulation. Finally, to validate the results of the manipulation simulation process, they are compared with the results of the existing researches. In the first phase of the manipulation, based on the simulation results, the critical time and force error for the sliding mode were 0.94 and 1.1%, respectively. Meanwhile, the critical time and force error for rotation mode are 1.3 and 1.7%, respectively. For manipulation, taking roughness into account, the critical time and force error for sliding and rotation modes in the first phase of manipulation are about 6%. The error for the second phase, using Wilson model, considering roughness for the particle and the substrate when the particle slides on the substrate is 3.2% as well. As a result, there is a good match between the simulation and the experimental results for both manipulation phases.
机译:本文的贡献是考虑到粗糙度,通过原子力显微镜研究椭圆形纳米颗粒的操作。对于第一阶段的操作,仅研究了基材的粗糙度,而对于第二阶段,则从颗粒移动基材开始,并考虑了颗粒粗糙度。颗粒是金材料。而且,尖端和基底由硅制成。在检查了接触力学的有效参数(包括Hertz,Jamari和Jeng-Wang模型的压痕深度和接触面积)之后,使用了两个Jamari和Jeng-Wang接触模型来考虑粒子-探针接触和粒子-基底分别联系。通过这两个模型,模拟了操纵过程的第一阶段。在此步骤结束时,将检测粒子开始移动的力和时间。操纵的下一个阶段从粒子运动开始开始,到到达目标点时结束,这称为操纵的第二阶段。为了模拟操纵的第二阶段,使用了威尔逊模型。此外,由于没有表面是完全光滑的表面,并且表面具有影响摩擦力的大小以及因此影响操纵关系的粗糙度,为了使结果更接近实际,本文中使用了Rumpf和Rabinovich模型。在建模基材粗糙度的第一阶段操作中,使用Rumpf和Rabinovich模型。此外,Rumpf模型用于在操作的第二阶段对颗粒和基材粗糙度进行建模。最后,为了验证操纵仿真过程的结果,将它们与现有研究的结果进行比较。在操作的第一阶段,基于仿真结果,滑动模式的临界时间和力误差分别为0.94和1.1%。同时,旋转模式的临界时间和力误差分别为1.3和1.7%。对于操纵,考虑到粗糙度,在操纵的第一阶段中,滑动和旋转模式的临界时间和力误差约为6%。使用Wilson模型,考虑到粒子和基底在基底上滑动时的粗糙度,第二阶段的误差也为3.2%。结果,两个操作阶段的仿真结果和实验结果之间都具有很好的匹配性。

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