CONCENTRATION MONITORING CLOSED LOOP CONTROL - PHASE 2

摘要

Aqueous-based cleaning systems using custom-engineered cleaning agents have become standard for cleaning electronics assemblies. For spray-in-air systems, typical wash bath concentration is maintained in the range of 10% to 20% by volume. Critical to the efficiency of these systems is wash bath concentration monitoring and control. However, as assemblies are cleaned, contamination, mainly comprised of solubilized flux residues, accumulates in the wash bath. Additionally, during the normal course of operation, wash bath volume is reduced due to evaporation and drag-out, thereby further affecting its concentration. Left unchecked, the effectiveness of the cleaning system is compromised, and the expected cleaning results will not be achieved.