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机译:掺Er(III)和Y(III)配合物的PMMA的光学性质
Vaclav Prajzler,1 Ivan Huttel,2 Oleksiy Lyutakov,2 Jiri Oswald,3 Vladimir Machovic,2 Vitezslav Jerabek11 Department of Microelectronics, Faculty of Electrical Engineering, Czech Technical University,16627 Prague 6, Czech Republic2 Institute of Chemical Technology, 16628 Prague 6, Czech Republic3 Institute of Physics, Academy of Sciences of the Czech Republic, 16253 Prague 6, Czech RepublicCorrespondence to: Vaclav Prajzler, e-mail: xprajzlv@feld.cvut.czContract grant sponsor: GA CR Grant (Czech Technical University, Prague), contract grant number: 102/09/P104, contract grant sponsor: MSM, contract grant number: 6840770014.DOI 10.1002/pen.21418Published online in Wiley InterScience (www.interscience.wiley.com).© 2009 Society of Plastics Engineers,;
机译:掺Er(III)和Y(III)配合物的PMMA的光学性质
机译:具有2,6-二甲基-3,5氨基乙基和不同的N,N-供体配体的新型铒(III)配合物,用于Ormosil和PMMA矩阵掺杂
机译:近红外发射emitting(por)和(iii)单卟啉配合物与二氧化硅干凝胶的杂交:合成,结构和光物理
机译:基于金属卟啉的铒(III)铒的分子设计,合成和发光特性,用于光学扩增金属卟啉
机译:掺III III-V半导体的光致发光特性。
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机译:掺RB的合成,表征和上转换性能;在808、980和1560 nm激发下的,、 CO共掺杂的三氧化二钇Y氧化物