首页> 外文期刊>Plasma Science, IEEE Transactions on >Calculation of the Tangential View of an H-Alpha Intensity Profile in the Large Helical Device
【24h】

Calculation of the Tangential View of an H-Alpha Intensity Profile in the Large Helical Device

机译:大型螺旋装置中H-α强度分布的切线视图的计算

获取原文
获取原文并翻译 | 示例

摘要

A tangential image of an H-alpha intensity profile in a large helical device (LHD) plasma is investigated by a neutral particle transport simulation using a detailed 3-D grid model including the geometry of the helical plasma and the vacuum vessel. The calculated image of the H-alpha intensity profile calculated by the simulation quite agrees with the observed image, which strongly suggests that there is no significant abnormal neutral particle sources in typical plasma discharge operation in LHD.
机译:通过中性粒子传输模拟,使用包含螺旋等离子体和真空容器几何形状的详细3-D网格模型,通过中性粒子传输模拟研究了大型螺旋装置(LHD)等离子体中H-alpha强度分布的切向图像。通过模拟计算得出的H-alpha强度分布图的图像与观察到的图像完全吻合,这强烈表明在LHD的典型等离子体放电操作中没有明显的异常中性粒子源。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号