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首页> 外文期刊>IEEE Transactions on Plasma Science >Effects of Supply Current and Armature Structure on Melting Characteristics of Armature Surface in Sliding Electric Contact
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Effects of Supply Current and Armature Structure on Melting Characteristics of Armature Surface in Sliding Electric Contact

机译:滑动电触头中供电电流和电枢结构对电枢表面熔化特性的影响

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摘要

In the process of electromagnetic launch, the melting on the armature surface tends to change the state of the armature/rail (AR) contact. Once the contact state is damaged, transition will appear easily. For this reason, it is necessary to analyze the factors affecting the melting characteristics of the armature surface. According to the Reynolds equation listed for the liquid metal film (LMF) on the AR contact interface, and by coupling the temperature, stress, and electromagnetic fields, this paper presents a thermoelastic magnetohydrodynamic model, which is used to analyze effects of the current waveform, and the length and angle of the armature tail on the surface melting rate and LMF thickness. The results show that for the same armature, if we want to achieve the same velocity within the same time range, the smoother the current waveform, the slower the surface melting rate and the thinner the minimum LMF thickness, and that for armatures of different key dimensions, in a certain range, the longer the armature tail, the slower the surface melting rate, but the larger the total melting amount and the thicker the minimum LMF thickness, and that the angle of armature tail has little effect on melting characteristics of the armature surface. What has been done in this paper is of great importance to improving the AR contact state and optimizing the performance of the electromagnetic launcher.
机译:在电磁发射过程中,电枢表面上的融化趋向于改变电枢/轨道(AR)接触的状态。一旦接触状态被破坏,过渡将很容易出现。因此,有必要分析影响电枢表面的熔化特性的因素。根据AR接触界面上的液态金属膜(LMF)列出的雷诺方程,并通过耦合温度,应力和电磁场,提出了一种热弹性磁流体动力学模型,该模型用于分析电流波形的影响,以及电枢尾部的长度和角度对表面熔化速率和LMF厚度的影响。结果表明,对于相同的电枢,如果要在相同的时间范围内达到相同的速度,则电流波形越平滑,表面熔化速度越慢,最小LMF厚度越薄,而不同键的电枢在一定范围内,电枢尾部的长度越长,表面熔化速度越慢,但是总熔化量越大,最小LMF厚度越厚,并且电枢尾部的角度对电枢的熔化特性影响很小。电枢表面。本文所做的工作对于改善AR接触状态和优化电磁发射器的性能非常重要。

著录项

  • 来源
    《IEEE Transactions on Plasma Science》 |2019年第1期|721-728|共8页
  • 作者单位

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

    Naval Univ Engn, Natl Key Lab Sci & Technol Vessel Integrated Powe, Wuhan 430033, Hubei, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Key dimensions of armature; liquid metal film (LMF); sliding electric contact; supply current; thermoelastic magnetohydrodynamic (TEMHD);

    机译:电枢的关键尺寸;液态金属膜(LMF);滑动电接触;电源电流;热弹性磁流体动力学(TEMHD);

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