Site‐selective atmospheric pressure plasma‐enhanced chemical vapor deposition process for micrometric deposition of plasma‐polymerized methyl methacrylate

摘要

An atmospheric pressure plasma chemical vapor deposition process designed for the site-selective deposition of organic functional materials with a sub-millimetric lateral resolution is presented in this study. Injecting methyl methacrylate vapor in plasma post-discharge allowed to synthesize plasma-polymerized methyl methacrylate (ppMMA) coatings on metallic, dielectric, and polymer substrates at close to room temperature (40 degrees C). A circular dot, as small as 400 mu m in diameter, of ppMMA is deposited and characterized by Fourier-transform infrared spectroscopy, X-ray photoelectron spectroscopy, and high-resolution mass spectrometry. Oligomeric species of poly-MMA up ton = 18 have been detected, evidencing the particularly "soft" polymerization offered by the presented process.