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H_2: The Critical Juncture between Polymerization and Dissociation of Hydrocarbons in a Low-temperature Plasma

机译:H_2:低温等离子体中烃的聚合与解离之间的关键关口

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摘要

The chemistry in an argon plasma jet, admixed with a small percentage of CH_4, C_2H_2, H_2 and mixtures thereof, is investigated by means of residual gas analysis. Polymerization of such hydrocarbon precursors is known to occur when their densities exceed the Ar+ ion density. This paper shows that polymerization also occurs for precursor gas flows far below the initial Ar~+ ion flow emanating from the plasma source. This is entirely due to the negative effect of H_2 on the Ar~+ ion density. Adding 1-2% of H_2 to the total argon and hydrocarbon gas flow suffices to initiate polymerization. Although, H_2 can be injected directly into the system, fragmentation of the hydrocarbon precursors themselves can likewise supply (part of) the required H_2. Polymerization is furthermore enhanced when both precursors are used together. The contribution of C_3H_y species to the plasma chemistry will likewise be substantiated.
机译:通过残留气体分析研究了在氩气等离子体射流中与少量CH_4,C_2H_2,H_2及其混合物混合的化学性质。已知当此类烃前体的密度超过Ar +离子密度时,就会发生聚合。本文表明,远低于从等离子体源发出的初始Ar〜+离子流的前体气体流也会发生聚合。这完全是由于H_2对Ar〜+离子密度的负面影响。将1-2%的H_2添加到总氩气和烃类气体中就足以引发聚合反应。尽管H_2可以直接注入系统中,但烃类前体本身的碎裂同样可以提供所需的H_2(部分)。当两种前体一起使用时,聚合作用进一步增强。 C_3H_y物质对等离子体化学的贡献也将得到证实。

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  • 来源
    《Plasma processes and polymers》 |2011年第9期|p.832-841|共10页
  • 作者单位

    Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;

    Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;

    Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;

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