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Semiconductor, topological semimetal, indirect semimetal, and topological Dirac semimetal phases of Ge_(1−x)Sn_x alloys

机译:半导体,拓扑半型,间接半型和拓扑Dirac半阶段Ge_(1-x)Sn_x合金

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摘要

Electronic structures of Ge_(1−x)Sn_x alloys (0 ≤ x ≤ 1) are theoretically studied by the nonlocal empirical pseudopotential method. For relaxed Ge_(1−x)Sn_x , a topological semimetal is found for x > 41% with gapless and band inversion at the Γ point, while there is an indirect-direct band-gap transition at x = 8.5%. For strained Ge_(1−x)Sn_x on a Ge substrate, semimetals with a negative indirect band gap appear for x > 43%, and the strained Ge_(1−x)Sn_x on Ge is always an indirect band-gap semiconductor for x < 43%. With appropriate biaxial compressive strains, a topological Dirac semimetal is found with band inversion at Γ and one pair of Dirac cones along the [001] direction.
机译:通过非局部经验伪能量方法理论地研究了Ge_(1-x)Sn_x合金(0≤x≤1)的电子结构。对于轻松的GE_(1-X)SN_X,在γ点处具有X> 41%的X> 41%,在γ点处发现拓扑半型,而在X = 8.5%时存在间接直接的带间隙过渡。对于GE基板上的应变GE_(1-X)SN_X,具有负间间带隙的半态出现为x> 43%,并且GE上的应变GE_(1-x)SN_X始终是X的间接带间隙半导体<43%。通过适当的双轴压缩菌株,在γ处的带反转和沿着[001]方向的一对狄拉科锥体,拓扑狄拉克半型。

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  • 来源
    《Physical Review. B, Condensed Matter》 |2017年第20期|201201.1-201201.5|共5页
  • 作者单位

    Graduate Institute of Electronics Engineering and Department of Electrical Engineering National Taiwan University Taipei 10617 Taiwan;

    Department of Electrical Engineering National Chung Hsing University Taichung 40227 Taiwan;

    Graduate Institute of Electronics Engineering and Department of Electrical Engineering National Taiwan University Taipei 10617 Taiwan Graduate Institute of Photonics and Optoelectronics National Taiwan University Taipei 10617 Taiwan National Nano Device Labs Hsinchu 30078 Taiwan;

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