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Band structure of a HgTe-based three-dimensional topological insulator

机译:基于HGTE的三维拓扑绝缘体的带结构

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From the analysis of the cyclotron resonance, we experimentally obtain the band structure of the three-dimensional topological insulator based on a HgTe thin film. Top gating was used to shift the Fermi level in the film, allowing us to detect separate resonance modes corresponding to the surface states at two opposite film interfaces, the bulk conduction band, and the valence band. The experimental band structure agrees reasonably well with the predictions of the k · p model. Due to the strong hybridization of the surface and bulk bands, the dispersion of the surface states is close to parabolic in the broad range of the electron energies.
机译:从回旋谐振的分析中,我们基于HGTE薄膜实验获得三维拓扑绝缘体的带结构。顶部门控用于将FERMI水平移入膜中,允许我们检测与表面状态相对应的单独的谐振模式,在两个相对的薄膜接口,散装传导和价带。实验频段结构与K·P型型号的预测相当好。由于表面和散装带的强杂交,表面状态的分散在电子能量的宽范围内接近抛物线。

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  • 来源
    《Physical review.B.Condensed matter and materials physics 》 |2020年第11期| 115113.1-115113.9| 共9页
  • 作者单位

    Institute of Solid State Physics Vienna University of Technology 1040 Vienna Austria;

    Institute of Solid State Physics Vienna University of Technology 1040 Vienna Austria;

    Institute of Solid State Physics Vienna University of Technology 1040 Vienna Austria;

    Rzhanov Institute of Semiconductor Physics and Novosibirsk Stale University Novosibirsk 630090 Russia;

    Rzhanov Institute of Semiconductor Physics and Novosibirsk Stale University Novosibirsk 630090 Russia;

    Rzhanov Institute of Semiconductor Physics and Novosibirsk Stale University Novosibirsk 630090 Russia;

    Dresden High Magnetic Field Laboratory (HLD-EMFL) Helmholtz-Zentrum Dresden-Rossendorf 01328 Dresden Germany Institute of Theoretical Physics Technische Universitat Dresden 01062 Dresden Germany;

    Institute of Solid State Physics Vienna University of Technology 1040 Vienna Austria;

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