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Screw dislocation induced phonon transport suppression in SiGe superlattices

机译:SiGe超晶格中的螺旋位错诱导的声子输运抑制

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摘要

Screw dislocations are known to impede the thermal transport of homogeneous nanowires by reducing the phonon relaxation time without affecting the phonon group velocity. By using molecular dynamics simulations in this study, we show that the impact of screw dislocation on the thermal conductivity of the SiGe superlattice nanowires depends on the period length. The analysis of phonon transmission spectra and phonon mean free paths indicate that strong phonon-screw dislocation scatterings occur for phonons in the frequency range of 3-8 THz. The screw dislocations change the phonon scattering mechanisms, which is the main cause of the thermal conductivity reduction. Contrary to the case of homogeneous nanowires, a sizable decrease in the phonon group velocity is found in superlattices with screw dislocations. This phenomenon is attributed to the larger number of Si-Ge bonds in the vicinity of the interface due to the slipping of the atomic planes. In contrast to the decreased thermal conductivity, the phonon propagation in the interface region of the nanowires is enhanced by screw dislocations. Our findings provide critical insights into the understanding of dislocation-heat transfer relationship in materials, especially in heterostructures where interfaces are vital for thermal transport.
机译:已知螺旋位错通过减少声子弛豫时间而不影响声子基团速度来阻碍均质纳米线的热传输。通过使用这项研究中的分子动力学模拟,我们表明,螺丝位错对SiGe超晶格纳米线的热导率的影响取决于周期长度。声子透射谱和声子平均自由程的分析表明,声子在3-8 THz的频率范围内会发生强烈的声子-螺旋位错散射。螺杆位错改变了声子散射机理,这是导热系数降低的主要原因。与均匀纳米线的情况相反,在具有螺旋位错的超晶格中,声子群速度显着下降。该现象归因于由于原子平面的滑移而在界面附近存在大量的Si-Ge键。与降低的热导率相反,声子在纳米线的界面区域中的传播通过螺旋位错得到增强。我们的发现为理解材料中的位错-热传递关系提供了重要的见解,尤其是在界面对热传输至关重要的异质结构中。

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  • 来源
    《Physical review》 |2019年第7期|075432.1-075432.7|共7页
  • 作者单位

    Southwest Jiaotong Univ Sch Phys Sci & Technol Key Lab Adv Technol Mat Minist Educ China Chengdu 610031 Sichuan Peoples R China;

    Southwest Univ Sci & Technol Engn Res Ctr Biomass Mat Sch Mat Sci & Engn Minist Educ Mianyang 621010 Sichuan Peoples R China;

    Soochow Univ Funct Nano & Soft Mat Lab FUNSOM Suzhou 215123 Peoples R China|Soochow Univ Collaborat Innovat Ctr Suzhou Nano Sci & Technol Suzhou 215123 Peoples R China;

    Univ Paris Saclay Lab EM2C CNRS Cent Supelec F-92295 Chatenay Malabry France|Univ Tokyo Inst Ind Sci LIMMS CNRS IIS UMI2820 Meguro Ku 4-6-1 Komaba Tokyo 1538505 Japan;

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