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Correlation between transport, dielectric, and optical properties of oxidized and nonoxidized porous silicon

机译:氧化和非氧化多孔硅的传输,介电和光学性质之间的相关性

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Using the correlation between transport, dielectric relaxation phenomena, and the state of oxidation of porous silicon, we have found that there are two major transport routes in the porous silicon medium. The first route of conduction via the disordered tissue that surrounds the silicon nanocrystals dominates for nonoxidized porous silicon and gradually disappears during the first stage of oxidation, where the disordered tissue is oxidized. The second route of tunneling and hopping in between the nanocrystals persists up to the second stage of oxidation where the nanocrystals are oxidized. This dual transport route model is consistent with the presence of two Meyer-Neldel rules and two power-law ac conductivities at mid and high temperatures. In addition, we have found that dc conduction is limited by narrow geometrical constrictions along the transport path that give rise to a Coulomb blockade type activation process. At lower temperatures the transport is characterized by a Cole-Cole relaxation associated with thermally activated intercrystallites hopping due to the shorter distances needed to walk by the carriers. Finally, for oxidized porous silicon we have found a new relaxation mechanism of interfacial polarization that is characterized by long relaxation times at high temperatures.
机译:利用传输,介电弛豫现象和多孔硅的氧化状态之间的相关性,我们发现多孔硅介质中有两种主要的传输途径。通过围绕硅纳米晶体的无序组织的第一传导途径在非氧化多孔硅中占主导地位,并在氧化的第一阶段逐渐消失,在此阶段,无序组织被氧化。在纳米晶体之间的隧穿和跳跃的第二种路径一直持续到第二阶段的氧化,在该阶段纳米晶体被氧化。这种双重运输路径模型与在高温下存在两个Meyer-Neldel规则和两个幂律交流电导率相一致。此外,我们发现直流传导受到沿传输路径的狭窄几何收缩的限制,从而引起库仑阻塞型激活过程。在较低的温度下,运输的特征是由于载流子行走所需的距离较短,因此与热活化的晶间跃迁相关的科尔-科尔弛豫。最后,对于氧化多孔硅,我们发现了一种新的界面极化弛豫机制,其特征是在高温下弛豫时间长。

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