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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >Photoinduced insulator-to-metal phase transition in VO_2 crystalline films and model of dielectric susceptibility
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Photoinduced insulator-to-metal phase transition in VO_2 crystalline films and model of dielectric susceptibility

机译:VO_2晶体薄膜中光诱导的绝缘体到金属的相变及介电敏感性模型

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摘要

A light-induced insulator-to-metal ultrafast phase transition (PT) was observed in VO_2 thin films deposited on single-crystal sapphire and amorphous glass substrates. The PT and optical properties of VO_2 were characterized by transient reflection, absorption, and transient grating nonlinear optical measurements. VO_2 films deposited on crystalline substrates are spatially ordered and show noticeable anisotropy in optical response upon PT. Structural and optical properties are dependent on the shear plane of the sapphire substrate. Significant twinning was found for VO_2 deposited on a (001)Al_2O_3 substrate while a VO_2 film on (012)Al_2O_3 is highly textured, without detectable twinning. VO_2 dielectric susceptibility is described by a proposed model. The V-O-V charge transfer was considered as a major process contributing to the linear and nonlinear dielectric susceptibility. The PT time and relaxation dynamics were found to be dependent on the film morphology and concentration of structural defects.
机译:在沉积在单晶蓝宝石和非晶玻璃衬底上的VO_2薄膜中观察到光诱导的绝缘体到金属的超快相变(PT)。通过瞬态反射,吸收和瞬态光栅非线性光学测量来表征VO_2的PT和光学性质。沉积在晶体基底上的VO_2薄膜在空间上是有序的,并且在PT时的光学响应中表现出明显的各向异性。结构和光学特性取决于蓝宝石衬底的剪切平面。发现沉积在(001)Al_2O_3衬底上的VO_2有明显的孪晶,而(012)Al_2O_3上的VO_2薄膜高度织构,没有可检测到的孪晶。 VO_2介电敏感性由提出的模型描述。 V-O-V电荷转移被认为是导致线性和非线性介电敏感性的主要过程。发现PT时间和弛豫动力学取决于膜的形态和结构缺陷的浓度。

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