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首页> 外文期刊>Physical review >Impact of disorder outside the CuO_2 planes of electron-doped superconductors: Different effect on localization and T_c between Gd and Sm doping
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Impact of disorder outside the CuO_2 planes of electron-doped superconductors: Different effect on localization and T_c between Gd and Sm doping

机译:电子掺杂超导体CuO_2平面以外的无序影响:Gd和Sm掺杂对局域性和T_c的不同影响

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摘要

The thermopower S(T), Hall coefficient R_H, and resistivity ρ(T) are studied for Nd_(1.85-x)M_xCe_(0.15)CuO_(4±δ) (A/=Gd and Sm) single crystals. Disorder is introduced into the cation sites outside the CuO_2 planes in the two systems and its degree is controlled by changing M content. Such doping nominally does not change the doped carrier density, which is confirmed by R_H S(T) is analyzed in terms of a semiempirical model above 120 K for both doping, which assumes the coexistence of a narrow electron band and a broad one. In this model, both the bandwidth for the density of states and the bandwidth of the effective conductivity broaden with increasing x for both doping, while the tendency for localization is increased for Gd doping but nearly unchanged for Sm doping, which could be understood by stronger electronic disorder for Gd doping than that for Sm doping. This may be resulted from the difference in ionic radius (Gd~(3+)
机译:研究了Nd_(1.85-x)M_xCe_(0.15)CuO_(4±δ)(A / = Gd和Sm)单晶的热功率S(T),霍尔系数R_H和电阻率ρ(T)。在两个系统中,无序被引入到CuO_2平面之外的阳离子位点,其程度通过改变M的含量来控制。这种掺杂名义上不会改变掺杂的载流子密度,这是通过R_H S(T)证实的,并根据高于120 K的半经验模型对两种掺杂进行了分析,该模型假定窄电子带和宽电子带并存。在该模型中,两种掺杂的状态密度带宽和有效电导率带宽都随x的增加而变宽,而Gd掺杂的局域化趋势增加,而Sm掺杂的局域化趋势几乎不变,这可以理解为更强Gd掺杂比Sm掺杂电子紊乱。这可能是由于离子半径的差异(Gd〜(3 +)

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