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首页> 外文期刊>Physical review >Scattering potentials at Si-Ge and Sn-Ge impurity dimers on Ge(001) studied by scanning tunneling microscopy and ab initio calculations
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Scattering potentials at Si-Ge and Sn-Ge impurity dimers on Ge(001) studied by scanning tunneling microscopy and ab initio calculations

机译:通过扫描隧道显微镜和从头算计算研究了Ge(001)上Si-Ge和Sn-Ge杂质二聚体的散射势

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摘要

Scattering potentials for π~* electrons at Si-Ge and Sn-Ge dimers on a Ge(001) surface are studied by scanning tunneling microscopy and ab initio calculations. Phase-shift analysis of standing waves in dI/dV images reveals that Si and Sn atoms located in the conduction path of π~* electrons form potentials with the sign opposite to each other. Density-functional calculations and simple calculations based on the nearly-free-electron model explain the observed potential structures. These results are qualitatively understood by relative p-orbital energy of the Si, Sn, and Ge atoms.
机译:通过扫描隧道显微镜和从头算计算研究了Ge(001)表面Si-Ge和Sn-Ge二聚体上π〜*电子的散射势。 dI / dV图像中驻波的相移分析表明,位于π〜*电子的传导路径中的Si和Sn原子形成势,符号彼此相反。基于近自由电子模型的密度函数计算和简单计算可解释观察到的电势结构。通过Si,Sn和Ge原子的相对p轨道能定性地理解这些结果。

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