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首页> 外文期刊>Physical review >Growth, structure, and magnetic properties of epitaxial Ni_xMn_(100-x) single layers and Co/Ni_xMn_(100-x) bilayers on Cu_3Au(100)
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Growth, structure, and magnetic properties of epitaxial Ni_xMn_(100-x) single layers and Co/Ni_xMn_(100-x) bilayers on Cu_3Au(100)

机译:Cu_3Au(100)上外延Ni_xMn_(100-x)单层和Co / Ni_xMn_(100-x)双层的生长,结构和磁性

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摘要

The growth and structure of single-crystalline ultrathin Ni_xMn_(100-x) films on Cu3Au(100), and also the magnetic properties of Co ultrathin films on Ni_xMn_(100-x)/Cu3Au(100) have been investigated by x-ray photo-electron and Auger electron spectroscopy, low-energy electron diffraction, reflection high-energy electron diffraction, and magneto-optical Kerr effect (MOKE). For the investigated concentration range (10≤x≤77), our results reveal good epitaxial layer-by-layer growth at a substrate temperature of 300 K. A weak c(2 × 2) superstructure was observed at the surface of all NiMn films. The average perpendicular interlayer spacing of the NiMn alloy films decreases from 1.88 A at x= 10 to 1.69 A at x=ll. The lattice parameters of equiatomic NiMn films were determined to be 3.52 A perpendicular to the sample surface and 3.76 A in the sample plane, indicating a face-centered tetragonal (fct) structure as expected for the Ll_0 NiMn phase with the c axis along the film normal ("c-axis growth"). For the Co/NiMn bilayers (23≤x≤55), MOKE hysteresis loops show a thickness-independent coercivity, suggesting no magnetic coupling at the Co/NiMn interface. Although the structural results indicate the formation of fct NiMn in the equiatomic concentration range, we have no indication of antiferromagnetism for the NiMn films epitaxially grown on Cu_3Au(100) at room temperature. This is contrary to the observations on Co/Ni_(50)Mn_(50) bilayers on Cu(100), where "a-axis growth" of NiMn occurs.
机译:用x射线研究了Cu3Au(100)上单晶Ni_xMn_(100-x)超薄膜的生长和结构,以及Ni_xMn_(100-x)/ Cu3Au(100)上Co超薄膜的磁性。光电子和俄歇电子能谱,低能电子衍射,反射高能电子衍射和磁光克尔效应(MOKE)。在所研究的浓度范围(10≤x≤77)下,我们的结果表明在300 K的衬底温度下良好的逐层外延生长。在所有NiMn膜的表面均观察到了较弱的c(2×2)超结构。 。 NiMn合金膜的平均垂直层间间隔从x = 10处的1.88A减小到x = 11处的1.69A。确定的等原子NiMn薄膜的晶格参数为垂直于样品表面的3.52 A和样品平面中的3.76 A,表明对Ll_0 NiMn相的面心为中心的四边形(fct)结构,c轴沿膜正常(“ c轴增长”)。对于Co / NiMn双层(23≤x≤55),MOKE磁滞回线显示出与厚度无关的矫顽力,表明Co / NiMn界面没有磁耦合。尽管结构结果表明在等原子浓度范围内形成了fct NiMn,但我们没有迹象表明在室温下在Cu_3Au(100)上外延生长的NiMn膜具有反铁磁性。这与在Cu(100)上发生Co / Ni_(50)Mn_(50)双层的观察结果相反,在该处NiNi发生“ a轴生长”。

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  • 来源
    《Physical review》 |2010年第13期|p.134423.1-134423.8|共8页
  • 作者单位

    Servico de Nanotecnologia, Centra de Desenvolvimento da Tecnologia Nuclear, 31270-901 Belo Horizonte, MG, Brazil;

    rnServico de Nanotecnologia, Centra de Desenvolvimento da Tecnologia Nuclear, 31270-901 Belo Horizonte, MG, Brazil;

    rnServico de Nanotecnologia, Centra de Desenvolvimento da Tecnologia Nuclear, 31270-901 Belo Horizonte, MG, Brazil;

    rnInstitut fuer Experimentalphysik, Freie Universitaet Berlin, 14195 Berlin, Germany;

    rnInstitut fuer Experimentalphysik, Freie Universitaet Berlin, 14195 Berlin, Germany;

    rnInstitut fuer Experimentalphysik, Freie Universitaet Berlin, 14195 Berlin, Germany;

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  • 正文语种 eng
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  • 关键词

    magnetic properties of monolayers and thin films; antiferromagnetics; thin film structure and morphology;

    机译:单层和薄膜的磁性反铁磁薄膜的结构和形态;

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