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Concentration and relaxation depth profiles of In_xGa_(1-x) As/GaAs and GaAs_(1-x)P_x/GaAs graded epitaxial films studied by x-ray diffraction

机译:用X射线衍射研究In_xGa_(1-x)As / GaAs和GaAs_(1-x)P_x / GaAs梯度外延膜的浓度和弛豫深度分布

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摘要

A method is proposed to determine the concentration and relaxation depth profiles in graded epitaxial films from x-ray reciprocal space maps (RSMs). Various approximations in the kinematical x-ray diffraction from epitaxial films with the misfit dislocation density depth profile are developed. We show that a symmetric and an asymmetric RSM, or two asymmetric RSMs, contain enough information to obtain the concentration, relaxation, and lattice tilt depth profiles without any additional assumptions. The proposed approach is applied to In_xGa_(1-x)As/GaAs and GaAs_(1-x)P_x/GaAs epitaxial graded films. The reconstructed concentration and dislocation density depth profiles are found to be in an agreement with the ones expected from the growth conditions.
机译:提出了一种从X射线互易空间图(RSM)确定梯度外延膜中浓度和弛豫深度的方法。在具有错配位错密度深度分布的外延膜的运动学X射线衍射中,已开发出各种近似值。我们表明,一个对称和不对称的RSM,或两个不对称的RSM,包含足够的信息即可获得浓度,弛豫和晶格倾斜深度剖面,而无需任何其他假设。所提出的方法适用于In_xGa_(1-x)As / GaAs和GaAs_(1-x)P_x / GaAs外延渐变膜。发现重建的浓度和位错密度深度曲线与生长条件所预期的一致。

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