机译:用X射线衍射研究In_xGa_(1-x)As / GaAs和GaAs_(1-x)P_x / GaAs梯度外延膜的浓度和弛豫深度分布
Department of Theoretical Physics, Belarusian State University, 4 Nezavisimosti av., 220030 Minsk, Belarus;
Bruker AXS GmbH, OEstliche Rheinbrueckenstr. 49, 76187 Karlsruhe, Germany;
Bruker AXS GmbH, OEstliche Rheinbrueckenstr. 49, 76187 Karlsruhe, Germany;
Bruker AXS K.K., 3-9 Moriya, Kanagawa, 221-0022 Yokohama, Japan;
Paul-Drude Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7,10117 Berlin, Germany;
solid surfaces and solid-solid interfaces: structure and energetics; experimental determination of defects by diffraction and scattering; linear defects: dislocations, disclinations;
机译:连续渐变In_xGa_(1-x)As / GaAs(001)和GaAs_(1-y)P_y / GaAs(001)变形缓冲层中的平衡晶格弛豫和错配位错
机译:GaAs_(1-x)P_x和Al_x Ga_(1-x)As的组成和与温度有关的能带隙和本征载流子浓度
机译:GaAs_(1-x)P_x / GaAs_(0.6)P_(0.4)量子点中磁场诱导的激子结合能
机译:用于从梯级X射线衍射的马赛克晶体模型,从阶梯分级in_xga_(1-x)和in_xal_(1-x)为/ gaas(001)变质缓冲器和器件结构
机译:通过发光光谱和X射线衍射测定在6H-SiC(0001)衬底上生长的GaN和Al(x)Ga(1-x)N薄膜的应变和组成。
机译:混晶GaAs_(1-x)P_x(Te)深中心的电声耦合和光电特性
机译:LpE和mOCVD技术生长Gaas和al(x)Ga(1-x)as外延薄膜生长参数的研究