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Rare Earth Doping of Topological Insulators: A Brief Review of Thin Film and Heterostructure Systems

机译:拓扑绝缘体的稀土掺杂:对薄膜和异质结构系统的简要介绍

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Magnetic topological insulators (MTIs) are a novel materials class in which a topologically nontrivial electronic band structure coexists with longrange ferromagnetic order. The ferromagnetic ground state can break timereversal symmetry, opening a gap in the topological surface states whose size is dependent on the magnitude of the magnetic moment. Doping with rare earth ions is one way to introduce higher magnetic moments into a material, however, in Bi2Te3 bulk crystals, the solubility limit is only a few percent. Using molecular beam epitaxy for the growth of doped (Sb,Bi)2(Se,Te)3 TI thin films, high doping concentrations can be achieved while preserving their high crystalline quality. The growth, structural, electronic, and magnetic properties of Dy, Ho, and Gd doped TI thin films will be reviewed. Indeed, high magnetic moments can be introduced into the TIs, which are, however, not ferromagnetically ordered. By making use of interfacial effects, magnetic longrange order in Dy doped Bi2Te3, proximitycoupled to the MTI Cr:Sb2Te3, has been achieved. Clearly, engineered MTI heterostructures offer new possibilities that combine the advantageous properties of different layers, and thus provide an ideal materials platform enabling the observation new quantum effects at higher temperatures.
机译:磁性拓扑绝缘体(MTIS)是一种新型材料类,其中拓扑非学生电子频带结构与Longrange铁磁序列共存。铁磁接地状态可以破坏微小的对称性,在晶体矩的大小取决于磁矩的大小的拓扑表面状态中打开间隙。用稀土离子掺杂是将更高的磁性矩引入材料的一种方式,然而,在Bi2Te3散装晶体中,溶解度仅为百分点。利用分子束外延对掺杂(Sb,Bi)2(Se,Te)3 Ti薄膜的生长,可以在保持其高结晶质量的同时实现高掺杂浓度。将回顾Dy,HO和GD掺杂Ti薄膜的生长,结构,电子和磁性。实际上,可以将高磁矩引入TIS,然而,这是不可磁的。通过利用界面效应,已经实现了DOPED BI2TE3中的磁孤奇序列,已经达到了MTI CR:SB2TE3。显然,工程化的MTI异质结构提供了新的可能性,这些可能性结合了不同层的有利性质,从而提供了理想的材料平台,使得能够在较高温度下观察新量子效应。

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