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首页> 外文期刊>Physica Status Solidi. A, Applications and Materials Science >Femtosecond pulsed laser deposition of CdS thin films onto quartz substrates
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Femtosecond pulsed laser deposition of CdS thin films onto quartz substrates

机译:飞秒脉冲激光将CdS薄膜沉积到石英衬底上

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摘要

CdS thin films were grown on quartz substrates using femtosecond pulsed laser deposition. X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL) measurements, and optical transmission spectroscopy were used to characterize the structure and optical properties of the deposited CdS thin films. The influence of substrate temperature in the range 100-600℃ on the structural and optical characteristics of the CdS thin films was systematically studied. The XRD and AFM results show that the crystalline and surface quality of the CdS thin films can be improved with increasing the substrate temperature to 450℃, but further increasing the substrate temperature to 600℃ may lead to degradation of the crystallinity and surface quality of the CdS thin films. The corresponding PL and optical transmission results show that the optical properties of the CdS thin films deposited by the femtosecond laser ablation technique can be improved by increasing the substrate temperature from 100 to 450℃.
机译:使用飞秒脉冲激光沉积在石英衬底上生长CdS薄膜。 X射线衍射(XRD),原子力显微镜(AFM),光致发光(PL)测量和光学透射光谱用于表征沉积的CdS薄膜的结构和光学性质。系统研究了衬底温度在100-600℃范围内对CdS薄膜结构和光学特性的影响。 XRD和AFM结果表明,将衬底温度提高到450℃可以改善CdS薄膜的晶体和表面质量,但进一步将衬底温度升高到600℃可能导致结晶度和表面质量的下降。 CdS薄膜。相应的PL和光传输结果表明,通过将飞秒激光烧蚀技术沉积的CdS薄膜的温度从100℃提高到450℃,可以改善其光学性能。

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