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首页> 外文期刊>Physica status solidi >Structural, optical and electrical properties of Sb doped and undoped AgIn_(1-x)Ga_xSe_2 and Ag(InGa)_5Se_8 thin films
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Structural, optical and electrical properties of Sb doped and undoped AgIn_(1-x)Ga_xSe_2 and Ag(InGa)_5Se_8 thin films

机译:掺杂和未掺杂Sb的AgIn_(1-x)Ga_xSe_2和Ag(InGa)_5Se_8薄膜的结构,光学和电学性质

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摘要

Antimony doped and undoped nanostructured thin films of AgIn_(1-x)Ga_xSe_2 and Ag(InGa)_5Se_8 on optically flat soda lime glass substrates are prepared by a three stage co-evaporation process. Energy dispersive analysis of X-rays (EDAX) and X-ray photoelectron spectroscopy in conjunction with atomic force microscopic technique and scanning electron microscopic technique are used, respectively, for compositional and surface morphological analysis of the films. X-ray diffraction (XRD) data on the films are analysed to estimate the influence of antimony doping and indium replacement by gallium, on the structure of the films, by determining the anion-cation bond lengths and anion displacement in the thin films. The obvious dependence of band gap on the composition of the films establishes the possibility of band gap tailoring of the films. Low temperature optical absorbance measurements in the temperature regime 90-301K are used for investigating the effect of doping on the temperature coefficient of band gaps of the films. Rutherford scattering spectra quantify the thickness of the films for conductivity (σ) measurements. The films exhibit n-type conductivity with two linear regions in the ln(σ) versus temperature inverse graphs, which indicate a defect activated conduction and intrinsic conduction, respectively, in the near room temperature and high temperature regions.
机译:通过三阶段共蒸镀工艺,在光学扁平钠钙玻璃基板上制备了AgIn_(1-x)Ga_xSe_2和Ag(InGa)_5Se_8的锑掺杂和非掺杂纳米结构薄膜。 X射线(EDAX)和X射线光电子能谱的能量色散分析分别与原子力显微镜技术和扫描电子显微镜技术结合使用,用于薄膜的组成和表面形态分析。通过确定薄膜中的阴离子-阳离子键长和阴离子位移,分析了薄膜上的X射线衍射(XRD)数据,以估算锑掺杂和铟置换镓对薄膜结构的影响。带隙对膜组成的明显依赖性建立了膜的带隙定制的可能性。在90-301K温度范围内的低温光吸收率测量用于研究掺杂对膜的带隙温度系数的影响。卢瑟福散射光谱可量化膜的厚度,以进行电导率(σ)测量。薄膜在ln(σ)与温度的反比图中显示具有两个线性区域的n型电导率,分别指示在室温附近和高温区域中的缺陷激活的传导和本征传导。

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