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机译:利用聚焦电子束诱导沉积的金属氧化物半导体器件的无掩模原型设计
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
Institute of Solid State Electronics, Vienna University of Technology, Floragasse 7/1-E362, Vienna 1040, Austria;
atomic layer deposition; capacitance-voltage characteristics; focused electron beam induced deposition; gold; MOS capacitors;
机译:聚焦电子束诱导沉积和聚焦离子束诱导沉积的技术基础和前景
机译:聚焦电子束诱导金沉积用于碳纳米管器件的电极
机译:通过聚焦电子束诱导沉积制备的亚微米霍尔器件
机译:离子束引起的碳化硅金属氧化物半导体器件中的击穿电压
机译:纳米级聚焦电子束诱导沉积的实验,理论和设备应用开发。
机译:比较电子和自由基的后沉积反应与聚焦电子束诱导沉积产生的Pt纳米结构
机译:通过电子束诱导的[Fe / Si] 2和[Fe3 / Si] 2多层电子束的混合制备FeSi和Fe3Si化合物,该多层由聚焦电子束诱导沉积生长