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Electrical and optical properties of r.f. co-sputtered ZnTe-Cu thin films

机译:r.f.的电和光学性质共溅射ZnTe-Cu薄膜

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摘要

ZnTe-Cu thin films with Cu concentration in the range 3-9 at% were prepared using r.f. magnetron co-sputtering. XRD results showed that the films were amorphous below 250 ℃, while above that temperature a polycrystalline phase with strong preferential orientation of crystallites appears. For undoped films, the XRD spectrum shows the enhancement of the 100 peak of orthorhombic ZnTe polycrystals while for the ZnTe-Cu films evidence was obtained for the presence of Cu_xZn_(1-x)Te phase with x near 0.20. The results of electrical measurements supports the view that the majority of Cu is in the Cu_xZn_(1-x)Te phase. The room temperature transmission and reflectivity were measured in the wavelength range 300 nm ≤ λ ≤ 3000 nm. The energy band gap was determined and found to vary significantly with substrate temperature. This was attributed to the appearance of band tails at the principle bands edges produced by perturbation in the local potential associated with the amorphous modification. For Cu-doped samples, further reduction in Eg is brought about through merging of the Cu acceptor density-of-states with the valence band.
机译:使用r.f.制备了Cu浓度在3-9at%范围内的ZnTe-Cu薄膜。磁控共溅射。 XRD结果表明,在250℃以下,薄膜为非晶态,而在该温度以上,则出现具有强烈的微晶优先取向的多晶相。对于未掺杂的薄膜,XRD光谱显示出正交晶ZnTe多晶体的100个峰的增强,而对于ZnTe-Cu薄膜,已获得存在x接近0.20的Cu_xZn_(1-x)Te相的证据。电学测量的结果支持以下观点:大多数Cu处于Cu_xZn_(1-x)Te相。在300nm≤λ≤3000nm的波长范围内测量室温透射率和反射率。确定能带隙并发现其随衬底温度显着变化。这归因于在与非晶态修饰相关的局部电势中的扰动所产生的主能带边缘处出现了带尾。对于掺杂铜的样品,Eg的进一步降低是通过将铜受体的态密度与价带合并而实现的。

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