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GaN-Si-MEMS structure fabricated from nano-column GaN quantum well crystal grown on Si substrate

机译:由在Si衬底上生长的纳米柱GaN量子阱晶体制成的GaN-Si-MEMS结构

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摘要

Nanocolumn-crystallized InGaN/GaN quantum well crystals were deposited on Si (111) substrate. Photoluminescence measurement demonstrated a wide emission wavelength from about 400 nm to 700 nm. We propose a new light source-device combined with Micro-Electro-Mechanical Systems (MEMS). The proposed device is monolithically composed of the GaN light source structures and Si MEMS. The directionrnof the light beam emitted from an array of the light source can be changed by a MEMS bears steering mechanism. A micro-stage with comb actuators was fabricated from the Si substrate. The InGaN/GaN quantum well film is patterned on the micro-stage. Basic researches on the growth of GaN crystals on Si substrate were also carried out.
机译:将纳米柱结晶的InGaN / GaN量子阱晶体沉积在Si(111)衬底上。光致发光测量显示出约400nm至700nm的宽发射波长。我们提出了一种与微机电系统(MEMS)相结合的新型光源设备。所提出的器件由GaN光源结构和Si MEMS整体构成。从光源阵列发出的光束的方向可以通过MEMS操纵机构来改变。由硅衬底制成具有梳状致动器的微台。在微台上对InGaN / GaN量子阱膜进行构图。还对在Si衬底上生长GaN晶体进行了基础研究。

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