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首页> 外文期刊>Physica status solidi >Photoluminescence study of hexagonal InN/lnGaN quantum well structures grown on 3C-SiC (001) substrates by molecular beam epitaxy
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Photoluminescence study of hexagonal InN/lnGaN quantum well structures grown on 3C-SiC (001) substrates by molecular beam epitaxy

机译:通过分子束外延在3C-SiC(001)衬底上生长的六方InN / InGaN量子阱结构的光致发光研究

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摘要

We have studied photoluminescence from hexagonal InN/lnGaN multiple quantum well structures grown on 3C-SiC (001) substrates with an InGaN underlayer by plasma assisted molecular beam epitaxy. We have observed photoluminescence spectra of InN/lnGaN MQWs with various wellrnwidths. The photoluminescence peak related to quantum wells was clearly observed even at room temperature and found to shift to higher energies with decreasing well width due to the quantum confinement effect. We also discuss the effect of the built-in electric fields on the PL peak energy.
机译:我们已经研究了通过等离子辅助分子束外延生长在具有InGaN底层的3C-SiC(001)衬底上生长的六方InN / InGaN多量子阱结构的光致发光。我们已经观察到具有各种阱宽的InN / InGaN MQW的光致发光光谱。即使在室温下,也清楚地观察到与量子阱有关的光致发光峰,并且由于量子限制效应而发现,随着阱宽度的减小,光致发光峰转移到更高的能量。我们还将讨论内置电场对PL峰值能量的影响。

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  • 来源
    《Physica status solidi》 |2008年第6期|1730-1732|共3页
  • 作者单位

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi-shi, Saitama 332-0012, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi-shi, Saitama 332-0012, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi-shi, Saitama 332-0012, Japan;

    Kanagawa Industrial Research Institute, 705-1 Shimo-Imaizumi, Ebina-shi, Kanagawa 243-0435, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    quantum wells; Ⅲ-Ⅴ semiconductors; quantum wells; quantum wells;

    机译:量子阱Ⅲ-Ⅴ族半导体;量子阱量子阱;

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