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A Heterogeneous Silicon on Lithium Niobate Modulator for Ultra-Compact and High-Performance Photonic Integrated Circuits

机译:用于超紧凑和高性能光子集成电路锂铌酸锂调节剂的异质硅

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摘要

We propose a heterogeneous silicon on lithium niobate (Si-LN) modulator which improves the compactness and modulating performance of large-scale photonic integrated circuits. Two types of configurations are employed on the Si-LN wafer for ultra-compact light-routing waveguides and high-performance light-modulating waveguides, respectively. The low loss taper transfers the optical modes between the two waveguides. In the heterogeneous Si-LN modulator, LN etching is nonessential and thus device processes are supported on a robust wafer. Our design analyzes the influence of the LN thickness on the performance. According to theoretical analysis and numerical simulation, the modulator supports a bend radius of 10 μm and edge-to-edge waveguide separation of 0.7 μm with respect to ∼1 cm beat length. When thickness of LN is 700 nm, the modulation efficiency reaches 1.76 V⋅cm and the bandwidth exceeds 350 GHz. This modulator is potentially suitable for ultra-compact, large-scale, high efficiency, and large bandwidth photonic integrated circuits (PICs).
机译:我们在铌酸锂(Si-LN)调节器上提出了一种异质硅,其提高了大规模光子集成电路的紧凑性和调节性能。在Si-LN晶片上采用两种类型的配置,用于超紧凑型光路线和高性能光调制波导。低损耗锥度在两个波导之间传输光学模式。在异构Si-LN调制器中,LN蚀刻是非态的,因此在鲁棒晶片上支撑装置处理。我们的设计分析了LN厚度对性能的影响。根据理论分析和数值模拟,调制器相对于〜1cm拍长,调制器支撑10μm的弯曲半径,弯曲半径为10μm,边缘到边缘波导分离0.7μm。当LN的厚度为700nm时,调制效率达到1.76V⋅CM,带宽超过350GHz。该调制器可能适用于超紧凑,大规模,高效率和大带宽光子集成电路(PICS)。

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