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Mechanistic studies of Candida albicans photodynamic inactivation with Porophyllum obscurum hexanic extract and its isolated thiophenic compounds

机译:念珠菌淫秽己烯醇提取物的念珠菌杀死灭活的机械研究及其分离的硫代化合物

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Porophyllum obscurum (Spreng) DC (Asteraceae) hexanic extract (PoHex) from aerial parts has demonstrated antifungal activity under UVA irradiation against Candida spp. isolates from patients with oropharyngeal candidiasis and four thiophenes were isolated as responsible of the activity. In the present work, we studied the photomechanisms whereby PoHex and their thiophenes produce photoinactivation of C. albicans.Reactive Oxygen Species generation by PoHex and thiophenes was evaluated: the production of superoxide anion, employing the NBT reduction assay; hydrogen peroxide, through the formation of a red quinoneimine; and singlet oxygen by using the 1,3-DPBF bleaching method. The action of ROS in fungal cells was investigated by evaluating binding of photosensitizer, leakage, apoptosis and stress sensibility that were performed by following M27-A3 guidelines, in parallel under "light" and "darkness" conditions.Results showed that the photosensitive antifungal activity of PoHex required oxygen and both type I (production of superoxide anion and hydrogen peroxide) and type II (production of singlet oxygen) reactions were involved. In addition, we found that ROS generated by PoHex did not cause release of cytoplasmic components due to membrane damage nor apoptosis of C. albicans. Treatment with PoHex and UVA increased cells sensitivities to osmotic stressors; did not reduce resistance to additional oxidative stress and possibly affected the structure of the cell wall. In addition, 2,2':5'2 '' terthiophene, the most active PS present in PoHex and the only one that generate single oxygen, at Minimal Fungicide Concentration, did not cause leakage nor apoptosis and did not increase sensitivities to osmotic and oxidative stressors.Results demonstrated that Photodynamic Inactivation employing PoHex under UVA does represent an alternative for topical antifungal therapy for oropharyngeal candidiasis.
机译:来自空中零件的突出菌淫秽(Spreng)DC(Asteraceae)己酶己酶(Asteraceae)己烯醇提取物(PoHex)在UVA辐照下对念珠菌SPP进行了抗真菌活性。来自口咽念珠菌病和四种噻吩的患者的分离物被分离为活性的负责。在目前的工作中,我们研究了Pohex及其噻吩的光学机制,产生了C. albicans的光灭活。评估了Pohex和噻吩的反应性氧物种:超氧化物阴离子的产生,采用NBT还原测定;过氧化氢,通过形成红醌胺;通过使用1,3-DPBF漂白方法和单线氧。通过评估通过在“光”和“黑暗”条件下平行的光敏剂,泄漏,凋亡和应力敏感性的结合来研究真菌细胞中的ROS在真菌细胞中的作用。结果表明了感光性抗真菌活性Pohex所需的氧气和I型I型(过氧化物阴离子和过氧化氢的产生)和II型(单次氧气)反应的反应。此外,我们发现由PoHex产生的ROS由于膜损伤和蛋白的凋亡而导致细胞质组分释放。用Pohex和UVA治疗增加细胞敏感性对渗透压力源;没有降低对额外氧化应激的抵抗力,并且可能影响细胞壁的结构。此外,2,2':5'2''萜烯,Pohex中存在的最活跃的PS和唯一的杀菌剂浓度,产生单一氧气的唯一一个,并没有引起泄漏和细胞凋亡,并没有增加对渗透的敏感性和渗透性氧化压力源证明了uva下使用Pohex的光动力灭活确实代表了对口咽念珠菌病的局部抗真菌疗法的替代方案。

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