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首页> 外文期刊>Photodiagnosis and Photodynamic Therapy >Mechanistic studies of Candida albicans photodynamic inactivation with Porophyllum obscurum hexanic extract and its isolated thiophenic compounds
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Mechanistic studies of Candida albicans photodynamic inactivation with Porophyllum obscurum hexanic extract and its isolated thiophenic compounds

机译:钝叶鬼臼提取物及其分离的噻吩化合物对白色念珠菌光动力学灭活的机理研究

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Porophyllum obscurum (Spreng) DC (Asteraceae) hexanic extract (PoHex) from aerial parts has demonstrated antifungal activity under UVA irradiation against Candida spp. isolates from patients with oropharyngeal candidiasis and four thiophenes were isolated as responsible of the activity. In the present work, we studied the photomechanisms whereby PoHex and their thiophenes produce photoinactivation of C. albicans.Reactive Oxygen Species generation by PoHex and thiophenes was evaluated: the production of superoxide anion, employing the NBT reduction assay; hydrogen peroxide, through the formation of a red quinoneimine; and singlet oxygen by using the 1,3-DPBF bleaching method. The action of ROS in fungal cells was investigated by evaluating binding of photosensitizer, leakage, apoptosis and stress sensibility that were performed by following M27-A3 guidelines, in parallel under "light" and "darkness" conditions.Results showed that the photosensitive antifungal activity of PoHex required oxygen and both type I (production of superoxide anion and hydrogen peroxide) and type II (production of singlet oxygen) reactions were involved. In addition, we found that ROS generated by PoHex did not cause release of cytoplasmic components due to membrane damage nor apoptosis of C. albicans. Treatment with PoHex and UVA increased cells sensitivities to osmotic stressors; did not reduce resistance to additional oxidative stress and possibly affected the structure of the cell wall. In addition, 2,2':5'2 '' terthiophene, the most active PS present in PoHex and the only one that generate single oxygen, at Minimal Fungicide Concentration, did not cause leakage nor apoptosis and did not increase sensitivities to osmotic and oxidative stressors.Results demonstrated that Photodynamic Inactivation employing PoHex under UVA does represent an alternative for topical antifungal therapy for oropharyngeal candidiasis.
机译:来自地上部分的暗淡鬼臼(Spreng)DC(菊科)己酸提取物(PoHex)已证明在UVA辐射下对念珠菌具有抗真菌活性。从口咽念珠菌病患者的分离物中分离出四个噻吩作为该活性的来源。在目前的工作中,我们研究了PoHex及其噻吩产生白色念珠菌的光灭活的光机制。过氧化氢,通过形成红色的奎宁亚胺;使用1,3-DPBF漂白法处理单线态氧。通过在“光照”和“黑暗”条件下平行评估M27-A3指导原则进行的光敏剂的结合,渗漏,凋亡和应激敏感性,研究了ROS在真菌细胞中的作用。结果表明: PoHex的光敏抗真菌活性需要氧气,并且涉及I型(产生超氧阴离子和过氧化氢)和II型(产生单重态氧)反应。此外,我们发现由PoHex产生的ROS不会由于膜损伤或白色念珠菌的凋亡而引起细胞质成分的释放。 PoHex和UVA处理可增加细胞对渗透压的敏感性。不会降低对额外氧化应激的抵抗力,并可能影响细胞壁的结构。此外,在最小的杀菌剂浓度下,2,2':5'2''对噻吩是PoHex中存在的最活跃的PS,并且是唯一产生单一氧气的PS,不会引起泄漏或凋亡,也不会增加对渗透压和渗透压的敏感性。结果表明,在UVA下使用PoHex进行光动力灭活确实代表了口咽念珠菌病局部抗真菌治疗的替代方法。

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