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Integrated optical and MEMS based design process for a variable optical attenuator

机译:基于集成光学和MEMS的可变光衰减器设计过程

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This paper presents the design, fabrication and characterization of a Variable Optical Attenuator (VOA). The VOA is based on a device known as the Mechanical Anti-reflection Switch (MARS) that has been well studied for modulation applications. Therefore, the requirements of the MEMS device need to be freshly ascertained and are done so in this paper taking the optical and MEMS parameters into account. In addition, the effect of the MEMS parameters on the optical ones and vise versa were also exploited in the design process. A good VOA should have a linear variation of attenuation with voltage and a large change in attenuation with a small change in voltage. In addition, the device should have as small an insertion loss as possible. Keeping this in mind, the dimensions of the device were chosen to achieve maximum performance. Four design variables were used to design MARS for the VOA application. This paper will discuss how they are related. A surface micro-machining fabrication method was developed using thermal evaporation and Plasma Enhanced Chemical Vapor Deposition (PECVD) techniques. It includes a fluoroform (CHF3) based reactive ion etching for silicon nitride. The devices were released using low surface tension liquids and Rapid Thermal Annealing (RTA). The achieved process yield was over 90%. Several devices were tested and attenuation up to 5.6 dB was observed experimentally.
机译:本文介绍了可变光学衰减器(VOA)的设计,制造和表征。 VOA基于一种称为机械抗反射开关(MARS)的设备,该设备已针对调制应用进行了深入研究。因此,需要重新确定MEMS器件的要求,并在本文中将光学和MEMS参数考虑在内。此外,在设计过程中还利用了MEMS参数对光学参数的影响,反之亦然。一个好的VOA应具有随电压的线性衰减变化,而随电压的小变化则衰减大。另外,该设备应具有尽可能小的插入损耗。牢记这一点,选择设备的尺寸以实现最佳性能。四个设计变量用于VOA应用程序的MARS设计。本文将讨论它们之间的关系。使用热蒸发和等离子增强化学气相沉积(PECVD)技术开发了一种表面微加工制造方法。它包括基于氟仿(CHF3)的氮化硅反应离子刻蚀。使用低表面张力液体和快速热退火(RTA)释放器件。获得的工艺产率超过90%。测试了几种设备,实验观察到高达5.6 dB的衰减。

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