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Large third-order optical nonlinearities in iron oxide thin films synthesized by reactive pulsed laser deposition

机译:反应性脉冲激光沉积法合成氧化铁薄膜中的大三阶光学非线性

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摘要

We report on a study of the third-order nonlinear optical properties of Fe2O3 thin films, grown by the method of laser deposition on silica (SiO2) substrates. The films were synthesized on substrates at different temperatures (293 K and 800 K) and under different oxygen pressures (0.1 Pa, 0.5 Pa, 1.0 Pa). The resulting films were amorphous, if grown on cold substrates (293 K), or polycrystalline otherwise. The third-order optical susceptibility chi((3)) of the films was determined by the Z-scan method at the wavelengths of 1064 nm and 532 nm and the laser pulse width of 20 ns. Remarkably high chi((3)) values on the order of 10(-4) esu at 1064 nm are obtained. The results show that Fe2O3 thin films are promising nonlinear materials for contemporary optoelectronics. (C) 2016 Elsevier B.V. All rights reserved.
机译:我们报告了对通过在二氧化硅(SiO2)衬底上进行激光沉积的方法而生长的Fe2O3薄膜的三阶非线性光学性质的研究。在不同的温度(293 K和800 K)和不同的氧气压力(0.1 Pa,0.5 Pa,1.0 Pa)下在基板上合成薄膜。如果在冷基板(293 K)上生长,则所得薄膜为无定形,否则为多晶。通过Z扫描法在1064nm和532nm的波长和20ns的激光脉冲宽度下确定膜的三阶光学敏感性chi((3))。在1064 nm处获得了10(-4)esu数量级的非常高的chi((3))值。结果表明,Fe2O3薄膜是现代光电子学中有希望的非线性材料。 (C)2016 Elsevier B.V.保留所有权利。

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