机译:改善Si的形态,表面粗糙度和溅射CuO薄膜的一些物理性质
Present Address: Center of Nanotechnology King Abdulaziz University Jeddah Saudi Arabia Materials Science and Nanotechnology Department Faculty of Postgraduate Studies for Advanced Sciences Beni-Suef University Beni-Suef Egypt;
Present Address: Center of Nanotechnology King Abdulaziz University Jeddah Saudi Arabia Electron Microscope and Thin Films Department Physics Research Division National Research Centre Dokki Giza Egypt;
Present Address: Center of Nanotechnology King Abdulaziz University Jeddah Saudi Arabia;
Present Address: Center of Nanotechnology King Abdulaziz University Jeddah Saudi Arabia Department of Physics Faculty of Science King Abdulaziz University Jeddah Saudi Arabia;
Present Address: Center of Nanotechnology King Abdulaziz University Jeddah Saudi Arabia Mechanical Engineering Department Faculty of Engineering King Abdulaziz University Jeddah Saudi Arabia;
CuO thin films; Si; Chemical states; X-ray diffraction; Atomic force icroscopy; Optical properties;
机译:通过溅射过程中引入氧气改善Ru薄膜的晶体取向和表面粗糙度
机译:射频溅射法制备CuO / Cu2O薄膜的形貌,组成,结构和光学性质
机译:溅射压力和功率对沉积的Co_2FeSi薄膜组成,表面粗糙度,微观结构和磁性的影响
机译:使用VO2靶的DC磁控溅射VO2薄膜的晶体结构,表面形貌,表面形貌和光学性能
机译:通过溅射沉积在硅(001)衬底上沉积的金薄膜的表面形态。
机译:超薄溅射金属对酚醛树脂薄膜的金属绝缘体转变:生长形态与表面自由能和反应性的关系
机译:退火温度对溅射TiAlSiN薄膜的形貌,机械,表面化学键合和太阳选择性特性的影响
机译:功率密度影响溅射类金刚石碳薄膜的物理和化学性质。