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Observation of single-ion induced charge collection in diode by a heavy ion microbeam system

机译:重离子微束系统观察二极管中的单离子诱导电荷

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In order to study the phenomena of single event upset (SEU), investigations of properties of single event transient current (SETC) in micro-scale semiconductor devices are in progress at the JAERI Takasaki heavy ion microbeam single-ion hit system. Irradiation damage effects are noticeable problems in SETC measurement, especially when a device is irradiated continuously by high-energy heavy ions in an area of 1 μm level. On the other hand, confined irradiation damages in such narrow localized area can be a useful landmark to indicate how large area or region of the device to be concerned with charge collection events. This information is very important for designing micro-scale devices with high SEU tolerance. When a micro-scale test device of silicon carbide (SiC) pn diode was irradiated by single 12 MeV nickel ions with a beam spot size of 1 μm in FWHM, successive irradiation damage effects were observed in the form of attenuation of the current pulse heights and the amount of total charge collected. The lateral extent of charge collection induced by every ion injection was evaluated by analyzing these data. The extent of charge collection in depth direction will be also discussed in conjunction with the thickness of the sensitive layer and the range of the projectiles.
机译:为了研究单事件不安定(SEU)现象,在JAERI高崎重离子微束单离子命中系统中,正在进行微型半导体器件中单事件瞬态电流(SETC)特性的研究。辐射损伤效应是SETC测量中的显着问题,尤其是当器件被水平1μm的高能重离子连续辐照时。另一方面,在这样狭窄的局部区域中的局限性辐照损伤可能是一个有用的标志,用于指示设备的大面积或大面积与电荷收集事件有关。此信息对于设计具有高SEU容忍度的微型设备非常重要。当在FWHM中用单个12 MeV镍点束大小为1μm的碳化硅(SiC)pn二极管微型测试设备进行辐照时,以电流脉冲高度衰减的形式观察到连续的辐照损伤效应以及收取的总费用。通过分析这些数据评估每次离子注入引起的电荷收集的横向范围。还将结合敏感层的厚度和弹丸的范围来讨论深度方向上电荷收集的程度。

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