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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Molecular dynamics study on stopping powers of channeled He and Li ions in Si
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Molecular dynamics study on stopping powers of channeled He and Li ions in Si

机译:硅中通道化He和Li离子的阻止能力的分子动力学研究

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摘要

A molecular dynamics simulation method for calculating the electronic stopping power for MeV energy He and Li ions in crystalline silicon is described. Two methods for calculating electronic stopping in channelling directions are studied. In the first method velocity dependent phase-shifts are calculated using a spherical average of a doping atom potential moving in an electron gas. In the second method an interpolation scheme between the density functional theory-calculation for low energies and a Bethe-like formula for high energies is used. The methods have been used to calculate stopping powers for He ions impinging in channeling directions of crystalline Si up to 3 MeV. The interpolation model has also been used to calculate channeling stopping power for Li ions up to 9 MeV. The simulation results are compared with recent experiments.
机译:描述了一种分子动力学模拟方法,用于计算晶体硅中MeV能量He和Li离子的电子停止能力。研究了两种计算通道方向电子停止的方法。在第一种方法中,使用在电子气中移动的掺杂原子势的球面平均值来计算速度相关的相移。在第二种方法中,使用在低能量的密度泛函理论计算和高能量的Bethe-like公式之间的插值方案。该方法已用于计算He离子在3 MeV以下沿晶体Si的沟道方向撞击的阻止能力。插值模型还用于计算高达9 MeV的锂离子的沟道停止功率。仿真结果与最近的实验进行了比较。

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